| 二氟化氮 | |
|---|---|
| |
| |
| 识别 | |
| CAS号 | 3744-07-8 [1] |
| PubChem | 138039 |
| ChemSpider | 121681 |
| SMILES |
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| 性质 | |
| 化学式 | NF2 |
| 若非注明，所有数据均出自一般条件（25 ℃，100 kPa）下。 | |
二氟化氮, 又称二氟氨基自由基，是一种自由基，化学式 NF2•。这个小分子和它的二聚体四氟肼存在平衡。[2]
N2F4 ⇌ 2 NF2•
其中，温度越高， NF2• 的含量就越多（与二氧化氮一样）[3]。
这种分子有奇数个电子，也足够稳定到可以在实验上研究。[4]
用处
二氟化氮是产生一氟化氙激发态激光的中间产物。三氟化氮是激光的制备原料，当三氟化氮被电子撞击时，会产生二氟化氮自由基和自由的氟离子:[1]
NF3 + e− → NF2 + F−
自由氟离子会和氙阳离子反应。[1]
二氟化氮可以继续反应，生成一氟化氮和氟离子：
NF2• + e− → NF + F−[1]
参考资料
- ↑ 1.0 1.1 1.2 1.3 Trainor, Daniel W. Electron dissociative attachment to nitrogen difluoride radicals. The Journal of Physical Chemistry. 1989-02, 93 (3): 1134–1136. doi:10.1021/j100340a022.
- ↑ F Fluorine: Compounds with Oxygen and Nitrogen. Gmelin Handbook of Inorganic Chemistry 4. Berlin: Springer. 1986: 162. ISBN 978-3-662-06341-5. doi:10.1007/978-3-662-06339-2.
- ↑ Johnson, Frederic A.; Colburn, Charles B. The Tetrafluorohydrazine-Difluoroamino Radical Equilibrium. Journal of the American Chemical Society. 1961-07, 83 (14): 3043–3047. doi:10.1021/ja01475a018.
- ↑ Brown, R. D.; Burden, F. R.; Hart, B. T.; Williams, G. R. The electronic structure of the NF2 radical. Theoretica Chimica Acta. 1973, 28 (4): 339–353. doi:10.1007/BF00529015.
扩展阅读
- Goodfriend, P.L.; Woods, H.P. The absorption spectrum of NF2. Journal of Molecular Spectroscopy. 1964-01, 13 (1–4): 63–66. Bibcode:1964JMoSp..13...63G. doi:10.1016/0022-2852(64)90055-4.
- Jacox, Marilyn E.; Milligan, Dolphus E.; Guillory, William A.; Smith, Jerry J. Matrix-isolation study of the vacuum-ultraviolet photolysis of NF3. Journal of Molecular Spectroscopy. 1974-08, 52 (2): 322–327. Bibcode:1974JMoSp..52..322J. doi:10.1016/0022-2852(74)90122-2.
- Heidner, R. F.; Helvajian, Henry; Koffend, J. Brooke. Tunable UV laser photolysis of NF2: Quantum yield for NF(a1Δ) production. The Journal of Chemical Physics. 1987-08, 87 (3): 1520–1524. Bibcode:1987JChPh..87.1520H. doi:10.1063/1.453262.
- Papakondylis, Aristotle; Mavridis, Aristides. Electronic and geometrical structure of the NF2 radical (PDF). Chemical Physics Letters. 1993-12, 216 (1–2): 167–172 [2020-06-23]. Bibcode:1993CPL...216..167P. doi:10.1016/0009-2614(93)E1254-E.
- Cai, Z.-L.; Sha, G.-H.; Zhang, C.-H.; Huang, M.-B. Ab initio study of low-lying electronic states of the NF2 radical. Chemical Physics Letters. 1991-03, 178 (2–3): 273–278. Bibcode:1991CPL...178..273C. doi:10.1016/0009-2614(91)87068-M.